发明名称
摘要 PROBLEM TO BE SOLVED: To suppress the surface oxidation of a reflection layer by cooling specified support down to specified temp. after deposition of an AlSi alloy-made reflection layer at specified support temp. and depositing a reflection-enhanced layer at specified support temp. which improves the rough surface of the AlSi reflection layer to provide a surface condition capable of displaying enough the light confining effect. SOLUTION: A support 100 is carried into a carrying vacuum chamber and deposition chamber, the back side of the support is closely contacted with a support heating heater to heat the support enough at 200-500 deg.C to generate an Ar plasma whereby an Ag light reflective layer 101 is formed. The support temp. is lowered below 100 deg.C in a support cooling gas atmosphere and then increased to 200-400 deg.C to generate an Ar plasma to form a surface reflection enhancing oxide layer 102 on the surface of the AlSi layer 101. This provides a surface condition capable of displaying enough the light confining effect of the reflective layer 101 and suppresses the surface oxidation of this layer enough to maintain a high reflectivity of the layer 101.
申请公布号 JP3017428(B2) 申请公布日期 2000.03.06
申请号 JP19950247198 申请日期 1995.09.26
申请人 发明人
分类号 H05H1/46;C23C14/34;C23C14/56;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L31/04 主分类号 H05H1/46
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