发明名称 Method of forming coating film of fluororesin by physical vapor deposition
摘要 In forming a coating film of a fluororesin, e.g. polytetrafluoroethylene, on a metallic or nonmetallic surface by a physical vapor deposition technique, problems attributed to the necessity of intensely heating or bombarding the fluororesin as the evaporating source or target material are solved by using a molecular weight reduced fluororesin not higher than 5000 in molecular weight. It is best to use a low molecular weight fluororesin powder obtained by heating a high molecular weight fluororesin in presence of a fluorine source and precipitating the molecular weight reduced polymer from the reaction gas.
申请公布号 US4863762(A) 申请公布日期 1989.09.05
申请号 US19880169834 申请日期 1988.03.18
申请人 CENTRAL GLASS COMPANY, LIMITED 发明人 ARAMAKI, MINORU;KUBO, MASAHIRO;NAKANO, HISAJI;KURASHIGE, HIROYUKI
分类号 C23C14/12;B05D7/24;C23C14/34 主分类号 C23C14/12
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