发明名称 |
Method of forming coating film of fluororesin by physical vapor deposition |
摘要 |
In forming a coating film of a fluororesin, e.g. polytetrafluoroethylene, on a metallic or nonmetallic surface by a physical vapor deposition technique, problems attributed to the necessity of intensely heating or bombarding the fluororesin as the evaporating source or target material are solved by using a molecular weight reduced fluororesin not higher than 5000 in molecular weight. It is best to use a low molecular weight fluororesin powder obtained by heating a high molecular weight fluororesin in presence of a fluorine source and precipitating the molecular weight reduced polymer from the reaction gas.
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申请公布号 |
US4863762(A) |
申请公布日期 |
1989.09.05 |
申请号 |
US19880169834 |
申请日期 |
1988.03.18 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
ARAMAKI, MINORU;KUBO, MASAHIRO;NAKANO, HISAJI;KURASHIGE, HIROYUKI |
分类号 |
C23C14/12;B05D7/24;C23C14/34 |
主分类号 |
C23C14/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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