| 摘要 |
PURPOSE:To obtain aptitude to exposure to radiation, especially, to ultraviolet rays and high sensitivity and superior storage stability and heat resistance by incorporating a compound to be allowed to generate an acid by irradiation with radiation and a polymer having specified structural units. CONSTITUTION:The radiation sensitive resin composition contains the compound to be allowed to generate an acid and the polymer having the structural units each represented by formula I in which R1 is H or methyl and (n) is 3 or 4. Proper compounds as the compound to be allowed to produce an acid, are as follows; (1) halogen of onium, such as salt of BF4<->, PF6<->, AsF6<->, SbF6<->, SiF6<->, ClO4<->, or CF3SO4<->, (2) an organic halogen compound, (3) naphthoquinonediazido-sulfonic acid, (4) a compound to be allowed to produce a sulfonic acid by irradiation with radiation, and the like. It is preferred to add this compound in an amount of 0.1 - 50wt.%, 0thus permitting the obtained composition to be high in sensitivity and superior in storage stability and heat resistance. |
