| 摘要 |
PURPOSE:To obtain a photographic support having improved antistatic properties and scratch resistance by forming a specified back coat layer on one side of a photographic hydrophobic support opposite to the other side on which a photosensitive emulsion layer is formed. CONSTITUTION:A photographic emulsion layer is formed on one side of a hydro phobic support and a back coat layer contg. at least one of chitosan and chitin and a non-aldehyde type hardening agent is formed on the other side. Chitin may be dissolved in a solvent such as formic acid-dichloroacetic acid or dimethylacetamide-LiCl, added to water and used as colloidal chitin. Chitosan may be used as a mixed aq. soln. contg. chitosan and hydrochloric acid, formic acid, acetic acid or the like. Both soln. may be prepd. by the another method. In case of 0.5% aq. chitosan soln., the viscosity is regulated to <=500cps, prefer ably <=100cps from the viewpoint of preparation and coating. A photographic support having tough film properties can be obtd. without deteriorating the antistatic properties. |
