发明名称 |
REDUCED LEAKAGE ANTIFUSE STRUCTURE AND FABRICATION METHOD |
摘要 |
<p>An antifuse (10) comprises an antifuse material (24) disposed between a lower conductive electrode (14) and an upper conductive electrode (26). The antifuse material (24) comprises a layer of amorphous silicon (20) disposed between two layers of silicon nitride (16, 20). A thin layer of silicon dioxide (18) is disposed between the layer of amorphous silicon (20) and one of the silicon nitride layers (16, 22).</p> |
申请公布号 |
WO9639717(A1) |
申请公布日期 |
1996.12.12 |
申请号 |
WO1996US09235 |
申请日期 |
1996.06.05 |
申请人 |
ACTEL CORPORATION |
发明人 |
MCCOLLUM, JOHN, L.;HAWLEY, FRANK, W. |
分类号 |
H01L21/82;H01L23/525;(IPC1-7):H01L23/525 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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