发明名称 REDUCED LEAKAGE ANTIFUSE STRUCTURE AND FABRICATION METHOD
摘要 <p>An antifuse (10) comprises an antifuse material (24) disposed between a lower conductive electrode (14) and an upper conductive electrode (26). The antifuse material (24) comprises a layer of amorphous silicon (20) disposed between two layers of silicon nitride (16, 20). A thin layer of silicon dioxide (18) is disposed between the layer of amorphous silicon (20) and one of the silicon nitride layers (16, 22).</p>
申请公布号 WO9639717(A1) 申请公布日期 1996.12.12
申请号 WO1996US09235 申请日期 1996.06.05
申请人 ACTEL CORPORATION 发明人 MCCOLLUM, JOHN, L.;HAWLEY, FRANK, W.
分类号 H01L21/82;H01L23/525;(IPC1-7):H01L23/525 主分类号 H01L21/82
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