发明名称 POSITIONING MARK FOR FORMING RESIST PATTERN AND MANUFACTURE OF MULTILAYERED PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a positioning mark, which can be used in a semi-additive method, will not reduce the precision of alignment of a photomask film with a substrate and can be read, even if a photosensitive dry film is pressure-bonded to the mark, and to provide a method of manufacturing a multilayered printed wiring board using the mark. SOLUTION: Ring recessed parts 64 are formed in an inter-layer insulating layer 38, and a positioning mark 66 is formed by precipitating a copper electroless plated film 40 by an electroless plating. When the alignment of a photomask film 70 with a substrate 20 is performed, a difference between the quantity of reflection of the film 40, which comes into contact with a dry film 41, and the quantity of reflection of the film 40 located at the mark 66, which does not come into contact with the film 41, is read by a CCD camera 200 and the mark 66 is recognized as a ring mark. As the ring part of the mark 66 reflects light strongly, the outline of the ring of the ring part can be clearly identified.
申请公布号 JPH11103166(A) 申请公布日期 1999.04.13
申请号 JP19970320316 申请日期 1997.11.06
申请人 IBIDEN CO LTD;SANEE GIKEN KK 发明人 ADACHI KAZUMASA;MIYAKE EIICHI
分类号 H05K1/02;G03F9/00;H05K3/06;H05K3/18;H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K1/02
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