| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having high sensitivity and capable of forming a high-definition pattern, a pattern forming apparatus equipped with the pattern forming material, and a permanent pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material comprises at least a support and a photosensitive layer on the support, wherein the support has a haze value of ≤5.0% and the photosensitive layer contains at least a binder, a polymerizable compound, a photopolymerization initiator, a thermal crosslinking agent and a heterocyclocondensation compound, wherein the photopolymerization initiator contains at least one α-aminoalkylphenone compound. <P>COPYRIGHT: (C)2007,JPO&INPIT |
