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发明名称
METHOD FOR FORMING ELECTRICAL INTERCONNECTION USING DUAL DAMASCENE PROCESS OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100711929(B1)
申请公布日期
2007.04.19
申请号
KR20050104310
申请日期
2005.11.02
申请人
DONGBU ELECTRONICS CO., LTD.
发明人
JEONG, SEONG HEE
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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