发明名称 Use of fluorinated additives in the etching or polishing of integrated circuits
摘要 Use in etching or polishing of integrated circuits of fluorinated additives of formula (I): <?in-line-formulae description="In-line Formulae" end="lead"?>T'(C<SUB>3</SUB>F<SUB>6</SUB>O)<SUB>n</SUB>(CFXO)<SUB>m</SUB>T (I)<?in-line-formulae description="In-line Formulae" end="tail"?> having a number average molecular weight in the range 250-400, in particular of the compound Cl(CF<SUB>2</SUB>-CF(CF<SUB>3</SUB>)O)<SUB>n</SUB>CF<SUB>2</SUB>COONa.
申请公布号 US7306747(B2) 申请公布日期 2007.12.11
申请号 US20030355072 申请日期 2003.01.31
申请人 SOLVAY SOLEXIS S.P.A. 发明人 VISCA MARIO;CHITTOFRATI ALBA;D'APRILE FIORENZA
分类号 B24B37/00;B44C1/22;C09G1/02;C09K3/14;C09K13/08;C11D1/00;C11D11/00;H01L21/304;H01L21/306;H01L21/321;H01L21/3213 主分类号 B24B37/00
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