PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD

摘要

A projection exposure apparatus, an optical member, and a method for manufacturing a device are provided to measure the characteristics of a projection optical system with high accuracy by using an optical unit mounted on a circular stage and a mirror mounted on a substrate stage. A projection optical system is to project a pattern image of an original plate onto a substrate. An original stage(5) is to maintain the original plate. A substrate stage(8) is to maintain a substrate. A measuring unit is provided with a Fizeau interferometer including an optical unit and a mirror. The optical unit includes a Fizeau surface that is to divide light beam into reference light beam and measured light beam. The mirror reflects the measured light beam passing the projection optical system. The optical unit is mounted on the original plate stage and the mirror is mounted on the substrate stage. The optical unit is capable of being detached from the original plate stage.