发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus that improves image quality by making it possible to electrostatically attracting samples of different sizes while suppressing an increase in a cost, and also making uniform an electric field at a sample edge part. SOLUTION: A sample holding means is an electrostatic chuck, and it is provided with: a reference plane portion enclosing a sample of a maximum size among sample sizes at the outer peripheral portion of the electrostatic chuck; and an opening portion enclosing sample sizes other than the maximum sample size, and a dummy sample which can be attached to and detached from the electrostatic chuck is provided, and the dummy sample is selected (or not used) when the sample sizes are changed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008311351(A) 申请公布日期 2008.12.25
申请号 JP20070156357 申请日期 2007.06.13
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MIZUOCHI MAKI;TOMITA SHOJI
分类号 H01L21/683;H01J37/20 主分类号 H01L21/683
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