| 发明名称 |
SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN |
| 摘要 |
A salt represented by the formula (I):;wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;A1 represents a C2 to C8 alkanediyl group; andR2 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and“m” represents an integer of 0, 1, 2 or 3. |
| 申请公布号 |
US2016170298(A1) |
申请公布日期 |
2016.06.16 |
| 申请号 |
US201514964842 |
申请日期 |
2015.12.10 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ANRYU Yukako;ICHIKAWA Koji |
| 分类号 |
G03F7/004;C07C309/17;C07D327/06 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;A1 represents a C2 to C8 alkanediyl group; andR2 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and“m” represents an integer of 0, 1, 2 or 3. |
| 地址 |
Tokyo JP |
