| 主权项 |
1. An adapter plate configured to be attachable to a universal platen of a cleaning unit for cleaning upper electrodes from a plasma processing chamber, the adapter plate comprising:
a support surface and a mounting surface, the mounting surface configured to be fastened to the universal platen of the cleaning unit, and the support surface configured to support an inner electrode or an outer electrode of a showerhead electrode assembly for cleaning upper or lower surfaces thereof, the support surface having a first set of holes configured to receive pins engaged in an upper surface of the inner electrode, a second set of holes configured to receive pins surrounding an outer periphery of the inner electrode when the lower surface of the inner electrode is supported on the support surface, a third set of holes configured to receive pins engaged in an upper surface of the outer electrode, and a fourth set of holes configured to receive pins surrounding an outer periphery of the outer electrode when the lower surface of the outer electrode is supported on the support surface wherein the support surface has an annular inner surface, an annular channel, which surrounds the annular inner surface, and a plurality of outer surfaces surrounding the annular channel, each of the plurality of outer surfaces having a curved inner edge, a curved outer edge, and a pair of side edges, and a plurality of side channels between adjacent outer surfaces, and wherein each of plurality of outer surfaces has one or more sets of holes configured to receive a pin and the adapter plate is an annular plate. |
