发明名称 DEVICE FOR EPITAXIAL DEPOSITING LAYERS FROM A LIQUID PHASE
摘要 <p>A device for simultaneously producing a plurality of substrate disks each having a plurality of different layers by a liquid phase epitaxy as each substrate disk is moved sequentially through different melts contained in the liquid phase characterized by a first unit having tongues slidably received therein and a plurality of chambers spaced along the direction of sliding of said tongues, a second unit having a crucible for each of said chambers being disposed for relative movement on the first unit from a position with the crucible out of communication with the chamber to a position in communication for transferring the melt from the crucible to the chamber and each of the said tongues having aligned recesses for receiving the substrate disk so that a row of substrate disks can be passed from one chamber to the next following chamber so that the disks in each row receive epitaxial layers sequentially.</p>
申请公布号 CA1167573(A) 申请公布日期 1984.05.15
申请号 CA19810386793 申请日期 1981.09.28
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HEINEN, JOCHEN
分类号 C30B19/00;C30B19/06;H01L21/02;H01L21/208;(IPC1-7):H01L21/208;H01L21/20 主分类号 C30B19/00
代理机构 代理人
主权项
地址