发明名称 |
Thin epitaxy resurf integrated circuit containing high voltage p-channel and n-channel devices with source or drain not tied to ground |
摘要 |
N-channel LDMOS and p-channel MOS devices for high voltage integrated in a BiCMOS integrated circuit and exploiting a RESURF condition are provided with a buried region of the same type of conductivity of the epitaxial layer and a doping level intermediate between the doping level of the epitaxial layer and the doping level of a well region. The devices may be configured as source or drain followers without problems.
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申请公布号 |
US5852314(A) |
申请公布日期 |
1998.12.22 |
申请号 |
US19960643152 |
申请日期 |
1996.04.30 |
申请人 |
SGS-THOMSON MICROELECTRONICS S.R.L. |
发明人 |
DEPETRO, RICCARDO;CONTIERO, CLAUDIO;ANDREINI, ANTONIO |
分类号 |
H01L21/8238;H01L27/06;H01L27/092;H01L29/06;H01L29/08;H01L29/10;H01L29/423;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L23/58 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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