发明名称 METHOD OF MEASURING MOSFET CAPACITANCE
摘要 PROBLEM TO BE SOLVED: To accurately obtain a fringe capacitance and overlap capacitance, by finding and separating both capacitances from measured values. SOLUTION: A method comprises steps of applying a gate voltage Vg to a gate electrode 103 of an MOSFET 101 with a DC current 106 fed to the electrode 103, connecting a DC current 108 to the drain electrode 104 through a DC ammeter 107 for measuring the drain current Id, applying a drain voltage Vd to measure an Id-Vg characteristic of each gate length L, finding a threshold voltage Vt and mutual inductance gm from the Id-Vg characteristic to compute a transistor gain factorβ, measuring a gate capacitance Cg every length L to make a Cg-L characteristic curve, obtaining a fringe capacitance from the intersect of the Cg axis at L=0 on the Cg-L curve, and subtracting the fringe capacitance from the intersect of the Cg axis atβ=0 on a Cg-βcurve to find an overlap capacitance.
申请公布号 JPH11154696(A) 申请公布日期 1999.06.08
申请号 JP19970319756 申请日期 1997.11.20
申请人 NEC CORP 发明人 TAMEGAYA YUKIO
分类号 G01R31/26;H01L21/66;H01L21/8234;H01L27/088;(IPC1-7):H01L21/66;H01L21/823 主分类号 G01R31/26
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