发明名称 PHOTOPOLYMERIZABLE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide the photopolymerizable composition superior in sensitivity and resolution and adhesion with a substrate and etching releasability, too, by using one of salicylic acid ester and phthalic acid diester each having a specified number of functional groups for a photopolymerizable monomer. SOLUTION: The photopolymerizable composition comprises a polymer binder and a photopolymerization initiator and the photopolymerizable monomer, i.e., the salicylic acid ester or phthalic acid diester each having 1-5 functional groups represented by the formula. Where R1 is a 2-5C alkyl (optionally substituted by a halogen atom or a hydroxyl group or a 1-5C alkyl group or a 1-5C alkoxy group or the like) or a -CH2O- group; (n) is an integer of 2-10; and R2 is an H atom or a 1-5C alkyl group optionally substituted by a hydroxyl group.
申请公布号 JP2000147759(A) 申请公布日期 2000.05.26
申请号 JP19980340982 申请日期 1998.11.13
申请人 TOKYO OHKA KOGYO CO LTD 发明人 ISHINO SHINICHIRO;OSHIO KIMITOKU;OBITANI HIROYUKI
分类号 G03F7/027;G03F7/028;G03F7/032;G03F7/033 主分类号 G03F7/027
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