发明名称 |
High efficiency color filter process to improve color balance in semiconductor array imaging devices |
摘要 |
Formation of integrated color filters for gain-ratio balanced semiconductor array imagers using a spectrophotometric feedback control loop to adjust layer thickness during the deposition process is disclosed. The fabrication sequence of G/R/B conventionally used in Prior Art has been changed to B/R/G or B/G/R to enable the process to adapt to yielding specified color gain-ratio values without the need for integrated circuit redesign. A high efficiency color filter process is demonstrated wherein the additional neutral-density attenuator layers and/or spacer layers required in Prior Art fabrication methods are eliminated. The disclosed process is shown to enable high-precision thickness control of the color filter layers. Blue coating lift-off problems and the steric effect associated with successive depositions of color layers having step-height variations are eliminated. Statistical process control (SPC) is optimized by calibration of the color balance gain-ratio using the product photodiode arrays and amplifier integrated circuits with a real-time spectrophotometric feedback control-loop during the dye or pigment layer deposition process.
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申请公布号 |
US6395576(B1) |
申请公布日期 |
2002.05.28 |
申请号 |
US20000593537 |
申请日期 |
2000.06.14 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
CHANG CHIH-KUNG;HSIAO YU-KUNG;PAN SHENG-LIANG;CHANG BII-JUNQ |
分类号 |
H01L27/146;(IPC1-7):H01L21/00 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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