| 摘要 |
PROBLEM TO BE SOLVED: To provide a solution processing apparatus which can prevent contamination on a substrate, caused when mist or the like generated in spin drying operation during substrate solution processing or after solution processing moves toward the upper side of the substrate and which can increase the efficiency of mist or the like to be discharged to the outside of the apparatus. SOLUTION: A cleaning unit (SCR) 21a of the solution processing unit includes a spin plate 41 for carrying a substrate G on support pins 42 and holding it by holding pins 43, a motor 47 for rotating the spin plate 41 in such a manner that the substrate G rotates in its plane, a processing cup 60 having an upper cup 61 disposed so as to be able to move vertically and to surround the peripheral edge of the substrate G and a fixed lower cup 62, and a buffer chamber 63 defined in the processing cup 60. An air flow and/or mist, generated by the rotation of the substrate G, is made to stay within the buffer chamber 63, so as to thereby prevent uprolling of the mist and diffusion thereof into the substrate G. |
