| 摘要 |
A resistor and a structure for changing an electrical resistance of a resistor. Initially, the resistor is provided, wherein the resistor has a length L and an electrical resistance R<SUB>1</SUB>. A portion of the resistor is exposed to a laser radiation, wherein the portion includes a fraction F of the length L of the resistor. After the resistor has been exposed to the laser radiation, the resistor has an electrical resistance R<SUB>2</SUB>, wherein R<SUB>2 </SUB>is unequal to R<SUB>1</SUB>.
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