发明名称 N-TYPE SEMICONDUCTOR MATERIALS FOR THIN FILM TRANSISTORS
摘要 <p>A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a substituted or unsubsitituted phenylalkyl group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100°C.</p>
申请公布号 KR20070095907(A) 申请公布日期 2007.10.01
申请号 KR20077013932 申请日期 2007.06.20
申请人 EASTMAN KODAK COMPANY 发明人 SHUKLA DEEPAK;FREEMAN DIANE CAROL;NELSON SHELBY FORRESTER
分类号 H01L29/786 主分类号 H01L29/786
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