发明名称 METHOD FOR FORMING ORGANIC LAYER PATTERN, ORGANIC LAYER PATTERN PREPARED BY THE SAME AND ORGANIC MEMORY DEVICES COMPRISING THE PATTERN
摘要 <p>A method for forming an organic layer pattern, an organic layer pattern through the same, and an organic memory device comprising the same are provided to implement a fine organic active layer pattern without a photoresist by using polyimide-based polymer. An organic memory device(100) comprises an organic active layer(20) sandwiched between a first electrode(10) and a second electrode(30). A polyimide-based polymer has a hetero pendant group containing heteroatom at a polyimide main chain. An organic layer pattern is formed by coating and drying the polyimide-based polymer, a photoinitiator, and a cross linkage agent to form a thin film and by exposing the thin film with a photomask having a desired pattern to form a negative pattern. The photoinitiator includes 1-phenyl-1,2-propanedione-2-(0-ethoxycarbonyl)oxime, 2,4,6-trimethyl benzoyl diphenyl phoshpine oxide, methyl phenylglyoxylate, benzil, 9,10-phenathalene quione, camphorquinone, dibenzosuberone, 2-ethlanthraquinone, 4,4'-diethylisophthalophenone, and 3,3',4,4'-tetra(tbutylperoxycarbonyl)benzophenone.</p>
申请公布号 KR20080036771(A) 申请公布日期 2008.04.29
申请号 KR20060103429 申请日期 2006.10.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, SANG KYUN;JOO, WON JAE;LEE, KWANG HEE;CHOI, TAE LIM;JUNG, MYUNG SUP
分类号 H01L21/027;C08G73/10;G03F7/027;G03F7/031;G03F7/037;H01L27/28;H01L51/05;H01L51/40 主分类号 H01L21/027
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