| 摘要 |
A fluid control system for writing instruments, correction fluid dispensers and self contained paint brush and paint reservoirs is disclosed. The fluid control system includes two filters or reservoirs, including a hydrophobic filter/reservoir and a hydrophilic filter/reservoir. The hydrophobic and hydrophilic elements may be spaced adjacent to and in abutting engagement with each other or a gap or space may be disposed therebetween. The hydrophobic element is disposed adjacent to the fluid reservoir (i.e., ink, correction fluid, paint reservoir or other water based fluid) and the hydrophilic element is disposed adjacent to the applicator tip or brush.
|
