| 发明名称 | Salt and photoresist composition comprising the same | ||
| 摘要 | A salt represented by the formula (I):;wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group;Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent;A− represents an organic anion; and“m” and “n” independently each represent an integer of 1 or 2. | ||
| 申请公布号 | US9348221(B2) | 申请公布日期 | 2016.05.24 |
| 申请号 | US201414519915 | 申请日期 | 2014.10.21 |
| 申请人 | SUMITOMO CHEMICAL COMPANY, LIMITED | 发明人 | Anryu Yukako;Ichikawa Koji;Yasue Takahiro |
| 分类号 | G03F7/004;C07C381/12;G03F7/027;G03F7/40;G03F7/038 | 主分类号 | G03F7/004 |
| 代理机构 | Birch, Stewart, Kolasch & Birch, LLP | 代理人 | Birch, Stewart, Kolasch & Birch, LLP |
| 主权项 | 1. A salt represented by the formula (I): wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a phenyl group which can have a substituent; A− represents an organic anion of formula (I-A): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group; Lb1 represents a C1-C24 divalent saturated hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom can be replaced by a fluorine atom or a hydroxyl group; and Y represents a methyl group or a C3-C18 alicyclic hydrocarbon group where a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and where a hydrogen atom can be replaced by a substituent; and “m” and “n” independently each represent an integer of 1 or 2. | ||
| 地址 | Tokyo JP | ||