发明名称 POSITIONING METHOD OF WAFER STAGE
摘要 <p>PURPOSE: To facilitate positioning of a wafer stage and maintenance of fitting thereof by conducting the positioning by notches provided in the flange part of a gas introducing part and leading it out of manufacturing equipment of a semiconductor and by a positioning part provided in an extension from the wafer stage. CONSTITUTION: Notches 5 for fitting a wafer stage 2 are provided in the rear part of a gas introducing part 3 and leading it out in equipment wherein the wafer stage 2 whereon a wafer is set is inserted into a reaction tube 1 and the wafer is treated by introducing the gas into the reaction tube 1 from the part 3 and by heating it by a heater 7, and positioning is conducted by the notches 5 and a positioning part 6 provided in an extension from the wafer stage 2. After the wafer stage 2 is inserted into the quartz reaction tube 1, in other words, the positioning part 6 provided in the extension from the wafer stage 2 is fitted closely to the notches 5 provided in the flange part of the part 3 for introducing the gas and leading it out. Thereby the positioning of the wafer stage 2 can be facilitated.</p>
申请公布号 JPH08330238(A) 申请公布日期 1996.12.13
申请号 JP19950134193 申请日期 1995.05.31
申请人 KOKUSAI ELECTRIC CO LTD 发明人 SUEYOSHI MAMORU;NAGOYA NORIO
分类号 H01L21/683;H01L21/205;H01L21/68;(IPC1-7):H01L21/205 主分类号 H01L21/683
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