| 摘要 |
A hologram exposure system that includes a spherically curved mirror surface positioned adjacent a substrate/hologram assembly that includes a spherically curved hologram recording layer supported by a spherically curved substrate surface, wherein the spherically curved mirror surface is concentric with the spherically curved substrate surface. A first rotating means provides for rotation of the curved mirror surface about a first axis that passes through (a) the center of curvature of the spherically curved substrate surface that supports the hologram recording layer, and (b) a point on the hologram recording layer that allows for convenient rotation about the first axis; and a second rotating means provides for rotation of the curved mirror surface about a second axis that is orthogonal to the first axis and intersects the first axis at the center of curvature of the substrate surface that supports the hologram recording layer. The desired hologram area of the recording layer is holographically exposed by controllably rotating the mirror/recording layer/substrate assembly about the first and second axes while illuminating the assembly with an exposure beam that is incident on the recording layer at the intersection of the recording layer with said first axis and passes through the recording layer to be reflected by said mirror surface.
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