发明名称 Optical element, lithographic apparatus comprising such optical element and device manufacturing method
摘要 An optical element includes a substrate having at least one surface on which a layer of material is disposed, the layer of material being selected to be at least partially transmissive to radiation with a predetermined wavelength lambda. The surface of material includes particles having a diameter in a range of 1-500 nm and the layer of material has a layer thickness in the range of 10-2000 nm. Undesired radiations, e.g. UV and DUV radiations, are substantially reduced or eliminated by scattering, e.g. Mie scattering and/or Raleigh scattering, and/or by absorption by the particles while desired radiations are transmitted to the surface of the optical element.
申请公布号 US7034923(B2) 申请公布日期 2006.04.25
申请号 US20040760558 申请日期 2004.01.21
申请人 ASML NETHERLANDS B.V. 发明人 BAKKER LEVINUS PIETER
分类号 G03B27/54;G21K1/06;G02B1/00;G02B1/10;G02B5/18;G02B5/28;G03B21/60;G03B27/42;G03F7/20;G21K5/02;H01L21/027 主分类号 G03B27/54
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