METHOD OF PATTERNING SELF-ORGANIZING MATERIAL, PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL AND METHOD OF PRODUCING THE SAME, AND PHOSOMASK USING PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL

摘要

It is intended to provide a method of pattering a self-organizing material whereby a self-organizing material having a self-organizing ability such as a nucleic acid can be aligned and immobilized in a desired manner on a substrate by using the imprint process, a self-organizing material-patterned substrate, and a method of producing the same, and a photomask. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.