发明名称 |
Monitoring apparatus and method particularly useful in photolithographically |
摘要 |
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
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申请公布号 |
US7289190(B2) |
申请公布日期 |
2007.10.30 |
申请号 |
US20060402009 |
申请日期 |
2006.04.12 |
申请人 |
NOVA MEASURING INSTRUMENTS LTD. |
发明人 |
DISHON GIORA;FINAROV MOSHE;NIREL ZVI;COHEN YOEL |
分类号 |
G03B27/32;H01L21/027;B82B1/00;G01B11/00;G01N21/00;G03D5/00;G03F7/20;G03F7/26;G03F7/30 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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