发明名称 PLATING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plating method by which plating undeposition does not occur and a step for electrode replacement is reduced even in alignment electroplating causing no lead bending or hit mark on an electronic component. SOLUTION: Wire-like electrodes 1 and contact assist wires 2 moving in parallel and opposed to the direction substantially intersecting an earth lead 18 and an insulating lead wire of headers 10 aligned on an alignment plate 19 at a right angle, are arranged. Since the wire like electrodes 1, insulating leads 16 and earth leads 18 are brought into contact with each other through a noncontact state, the contact does not converge and the plating undeposition does not occur and by supplying peeling current in the noncontact state, the deposition of a plating composition in the wire like electrode 1 is prevented. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008024986(A) 申请公布日期 2008.02.07
申请号 JP20060198819 申请日期 2006.07.21
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KOJIMA YUKI
分类号 C25D17/08;C25D7/00;C25D21/00 主分类号 C25D17/08
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