发明名称 METHOD OF TRANSFERRING SUBSTRATE, TRANSFER SYSTEM AND LITHOGRAPHIC PROJECTION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of transferring a substrate and a transfer system, having more improved placement accuracy than hitherto known. <P>SOLUTION: This method can transfer a substrate from a first substrate holder, e.g. a pre-alignment unit to a second substrate holder, e.g. a substrate table in a lithographic apparatus by a transfer unit, based on transfer data used available thereto. First, a substrate is provided to the first substrate holder. Subsequently, a positional difference of the substrate is measured and positional adjustment data are calculated based on the measured positional difference. Then, the second substrate holder is moved to its reference position in accordance with the positional adjustment data. Finally, the substrate is transferred from the first substrate holder to the second substrate holder by the transfer unit in accordance with the transfer data, and the substrate is disposed on the second substrate holder after moving. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009135442(A) 申请公布日期 2009.06.18
申请号 JP20080262638 申请日期 2008.10.09
申请人 ASML NETHERLANDS BV 发明人 ALBERTI JOZEF AUGUSTINUS MARIA;VAN NUNEN GERARDUS PETRUS MATTHIJS;GROENSMIT FRANS ERIK;COMPEN RENE THEODORUS PETRUS
分类号 H01L21/68;H01L21/027 主分类号 H01L21/68
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