| 摘要 |
PURPOSE:To enhance photosensitivity by forming an electric charge retaining layer made of a hardened film composed mainly of a specified silicone resin. CONSTITUTION:The charge retaining layer formed on an As-Se type photoconductive layer is made of the hardened film composed mainly of the silicone resin containing Si and O in an amount of 55-88wt.%, C in an amount of 10-30wt%, H in an amount of 1-10wt.%, and N in an amount of 1-5wt.% of the total amount of the charge retaining layer. If the content of C is <10wt.%, the film becomes brittle, if it is >30wt.%, the film becomes soft and low in scratching resistance, and if the content of H is <1, the film poorly hardenes, and if the content of N <=1wt.%, the film is low in hardness, and deteriorates in adhesion to various materials, and if it is >5wt.%, the hardened film deteriorates in weather resistance, and especially, becomes colored with the lapse of time, thus permitting the obtained film to be superior in scratch resistance, adhesion, and weather resistance, and enhanced in surface hardness and photosensitivity. |
