SURFACE-COVERED CARBONIZED TUNGSTEN GROUP CEMENTED CARBIDE MADE AND MILL WHOSE HARD VAPOR DEPOSITION LAYER HAS EXCELLENT SEPARATION RESISTANCE

摘要

PURPOSE:To enable hard vapor deposition layers to exhibit excellent separation resistance even when they are used in high feed cutting or high notch cutting by making the outermost side unit hard vapor deposition layer equal to a single unit hard vapor deposition layer among plural unit hard vapor deposition layers. CONSTITUTION:A bottom edge on a tip surface of a cutting edge part and a flank relief 3a of an outer peripheral edge 3 to similarly form a cutting edge part are covered with a single unit hard vapor deposition layer T1. A part except to form the single unit hard vapor deposition layer in this cutting edge part is covered with plural unit hard vapor deposition layers T1 to T4, and among the plural unit hard vapor deposition layers, the outermost side unit hard vapor deposition layer T1 is made equal to the single unit hard vapor deposition layer. These unit hard vapor deposition layers are formed of a single kind of single layer or two or more kinds of plural layers among Ti, TiC, TiN, TiCN, (Ti, Ab) N, (Ti, Al) CN and Al2O3. Thereby, the hard vapor deposition layers exhibit excellent separation resistance.