发明名称 Trench isolation structures for a semiconductor device
摘要 A semiconductor device includes a body of semiconductor material having first trenches and second trenches. Each of the first trenches has vertical sidewalls and each of the second trenches has tapered sidewalls. First transistors are arranged in said semiconductor body and are isolated from each other by the first trenches. Second trenches are arranged in the semiconductor body and are isolated from each other by the second trenches./!
申请公布号 US5753961(A) 申请公布日期 1998.05.19
申请号 US19950467541 申请日期 1995.06.07
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TSUCHIAKI, MASAKATSU
分类号 H01L21/302;H01L21/265;H01L21/3065;H01L21/308;H01L21/76;H01L21/762;H01L21/8242;H01L21/8244;H01L27/108;H01L27/11;H01L27/118;(IPC1-7):H01L29/00 主分类号 H01L21/302
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