| 摘要 |
PROBLEM TO BE SOLVED: To provide a transparent conductive material which can be produced at a low cost, which is excellent in conductivity and transparency and which shows excellent etching processability of a transparent conductive film when the material is formed into a film, to provide a sputtering target to be used to form a film of this material, and to provide a transparent conductive glass and a transparent conductive film material having the transparent conductive film. SOLUTION: The transparent conductive material consists of a compsn. which contains tin oxide, indium oxide and zinc oxide satisfying, in terms of metal atomic ratio, Sn/(Sn+In+Zn)=0.250 to 0.475, In/(Sn+In+Zn)=0.025 to 0.550, and Zn/(Sn+In+Zn)=0.025 to 0.575, which contains indium oxide and zinc oxide as a hexagonal laminar compd. expressed by In2O3(ZnO)m, wherein m is an integer 2 to 20, and which contains tin oxide and zinc oxide in a spinel structure compd. expressed by Zn2SnO4. The sputtering target consists of the above-mentioned material. The transparent conductive glass and the transparent conductive film material have the transparent conductive film produced by using this target. |
