POLISHIING APPARATUS AND POLISHIING METHOD

摘要

The present invention realizes a polishing apparatus capable of chamfering an end face of a large-sized substrate at a high precision for a table unit for mounting the substrate. A substrate is mounted on a table unit and is fixedly held in a predetermined reference state. A first polishing unit includes a polishing grind stone for polishing an end face of the substrate held on the table unit and substrate side edge portion supporting means for supporting the lower surface of a side edge portion of the substrate in the vicinity of the end face of the substrate to be polished by the polishing unit. The first polishing unit is moved together with the substrate side edge portion supporting means by a first polishing unit moving means along the end face of the substrate while the polishing grind stone is polishing the end face of the substrate.