| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for supplying an anisotropic monochrome neutral beam by non-dipolar electron plasma, which make possible to overcome problems in connection with an etching efficiency, microloading, charge damage, TMP flow rate, and/or trade-offs between these parameters.SOLUTION: NB-NEP apparatus 50 comprises: a first plasma dielectric tube/chamber 58 operable to produce first plasma at a first plasma potential; and a second plasma dielectric tube/chamber 64 operable to produce second plasma at a second plasma potential higher than the first plasma potential. The second plasma is produced by an electron flux from the first plasma. The NB-NEP apparatus has a dielectric (insulator) neutralizer grid 72 which is not grounded. The neutralizer grid 72 is arranged so that a substrate in the second plasma dielectric tube/chamber 64 is exposed to a substantially anisotropic neutral particle beam going out of the neutralizer grid 72.SELECTED DRAWING: Figure 3 |
