| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method which is advantageous in improving exposure accuracy.SOLUTION: An exposure method comprises: a first exposure process for performing an exposure processing by irradiating a projection optical system so as to set pupil surface illumination distribution of the projection optical system as first pupil surface illumination distribution; a second exposure process for performing the exposure processing by irradiating the projection optical system, after the first exposure process, so as to set the pupil surface illumination distribution as second pupil surface illumination distribution different from the first pupil surface illumination distribution; a variation derivation process for, on imaging performance of the projection optical system in the exposure process irradiated by the first pupil surface illumination distribution, deriving variations ΔFA and ΔFB of the imaging performance in a condition that the pupil surface illumination distribution is set as second pupil surface illumination distribution; and a correction amount derivation process for deriving a correction amount for correcting the imaging performance of projection optical system in the second exposure process by using the variation derived in the variation derivation process. In the second exposure process, the imaging performance of projection optical system is corrected with the derived correction amount, and the exposure processing is performed.SELECTED DRAWING: Figure 6 |
