| 摘要 |
In an etching process of a bevel part, abnormality in an output value of a laser beam is detected. Disclosed is an etching processing method using a bevel etching apparatus for etching a substrate by irradiating a laser beam, the bevel etching apparatus including a laser generator and an image capturing unit. The method includes the steps of: by the image capturing unit, capturing an image of an inner part of a processing container by illuminating the inner part of the processing container by scattered light of the laser beam emitted from the laser generator; calculating the brightness of an image of a predetermined area out of the captured image of the inner part of the processing container; and monitoring, based on data indicating a correlation between an output value of the laser beam output from the laser generator and the brightness, the output value of the laser beam with respect to the calculated brightness. |
