| 发明名称 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | ||
| 摘要 | Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1. | ||
| 申请公布号 | US9405188(B2) | 申请公布日期 | 2016.08.02 |
| 申请号 | US201414445567 | 申请日期 | 2014.07.29 |
| 申请人 | Samsung SDI Co., Ltd. | 发明人 | Lee Jong-Hwa;Kwon Ji-Yun;Kim Sang-Soo;Noh Kun-Bae;Park Eun-Bi;Baek Jae-Yeol;Lee Bum-Jin;Lee Sang-Haeng;Hwang Eun-Ha |
| 分类号 | G03F7/023;C08G73/10;C08G73/22;G03F7/022;G03F7/075 | 主分类号 | G03F7/023 |
| 代理机构 | Additon, Higgins & Pendleton, P.A. | 代理人 | Additon, Higgins & Pendleton, P.A. |
| 主权项 | 1. A positive photosensitive resin composition, comprising: (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 5:20 to about 20:5, and wherein the thermal acid generator comprises one or more compounds represented by the following Chemical Formulae 45 to 48: | ||
| 地址 | Yongin-si KR | ||