发明名称 |
Integrated metal grating |
摘要 |
An integrated circuit includes a substrate, a metal grating disposed over the substrate, and a waveguide layer disposed over or under the metal grating. The metal grating is arranged to change a propagation direction of an optical signal and the waveguide layer is arranged to guide the optical signal to a desired direction. |
申请公布号 |
US9405063(B2) |
申请公布日期 |
2016.08.02 |
申请号 |
US201313915300 |
申请日期 |
2013.06.11 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lai Jui Hsieh;Bao Tien-I;Chen Hai-Ching;Kuo Ying-Hao |
分类号 |
G02B6/124;G02B6/34;G02B6/12;H01L31/0203;G02B6/42 |
主分类号 |
G02B6/124 |
代理机构 |
Slater Matsil, LLP |
代理人 |
Slater Matsil, LLP |
主权项 |
1. An integrated circuit, comprising:
a metal grating disposed over a substrate; at least a first waveguide layer disposed over or under the metal grating; a metallization layer disposed over the substrate; and a photo detector disposed under the metallization layer; wherein:
the metal grating is arranged to change a propagation direction of an optical signal;the first waveguide layer is arranged to guide the optical signal towards the photo detector; andthe metallization layer comprises an extending portion that extends over at least a portion of the photo detector, the extending portion of the metallization layer adapted to convey an electrical signal generated by the photo detector. |
地址 |
Hsin-Chu TW |