| 摘要 |
An exposure apparatus includes an imaging optical system to project, in sequence, images of a pattern of an original upon different regions of a workpiece, the imaging optical system having an optical axis, a detecting system to irradiate a predetermined portion of a first region of the workpiece to detect the position of the first portion with respect to a direction of the optical axis of the imaging optical system, a workpiece carrying stage for carrying thereon the workpiece and being movable in a plane perpendicular to the optical axis, the workpiece carrying stage being movable to allow detection of the position of the first region with respect to the direction of the optical axis by the detecting system and the projection of the image of the pattern upon the first region by the imaging optical system, an aligning system to bring the position of the first region with respect to the direction of the optical axis into coincidence with the image of the pattern projected by the imaging optical system, and a correcting system to move the workpiece carrying stage to a position which is different from a position at which the image of the pattern of the original can be projected upon the second region.
|
