| 摘要 |
The invention relates to a process for producing a structure with integrated optical waveguide and mirror, comprising the stages consisting in: etching a substrate to form an inclined plane on the substrate, depositing by epitaxy, on the face of the substrate carrying the inclined plane, various layers of materials capable of forming an optical waveguide, clearing away the substrate, via its face opposite the epitaxed layers, up to the inclined plane, to form a mirror capable of reflecting light from the optical waveguide in a given direction.
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