DRY ETCHING METHOD

摘要

PURPOSE:To prevent the contamination with the metal from an etching chamber by protecting the metal or metallic compd. constituting the etching chamber without deteriorating the etching characteristic. CONSTITUTION:The valves in the gas introducing unit 11 for the lines of not only chlorine 15 but also oxygen 14 are opened when the gases are introduced, the amt. of oxygen mixed in the chlorine is accurately controlled by a mass flow controller 12, and the gaseous mixture is introduced into a vacuum chamber 3. As a result, the variation of the etching rate and uniformity with time is prevented.