发明名称 Positive-working radiation-sensitive mixture and production of relief structures
摘要 A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) <IMAGE> and the organic compound (b) is a sulfonium salt of the formula (IV) <IMAGE> (IV) The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.
申请公布号 US5846689(A) 申请公布日期 1998.12.08
申请号 US19960708818 申请日期 1996.09.09
申请人 BASF AKTIENGESELLSCHAFT 发明人 SCHWALM, REINHOLD;FUNHOFF, DIRK;BINDER, HORST
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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