| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an extreme ultra-violet ray source device capable of evading the supply of discharge gas to a chamber in the case of an intermission, and appropriately adjusting pressure in a discharge gas introduction pipe, so as to excellently restart the discharge when the discharge is being stopped. <P>SOLUTION: The discharge gas containing an extreme ultra-violet ray radiation species is supplied to a plasma generating part 106 inside the chamber 100 via the discharge gas introduction pipe 11. EUV light generated in the plasma generating part 106 is collected by a condensing mirror 101 and emitted from a light take-out part 104. A second pressure monitor 6 detects the pressure inside the discharge gas introduction pipe 11. When the detected pressure exceeds the prescribed pressure, an exhaust valve 5 arranged in a discharge gas exhaust pipe 12 is opened, so that the discharge gas is exhausted from a second exhaust unit 8. When the pressure inside the discharge gas introduction pipe 11 is reduced, the exhaust valve 5 is closed, so that the discharge gas is prevented from being exhausted by the second exhaust unit 8. It is also adequate that purge gas is introduced to the discharge gas introduction pipe 11 in a plasma non-generating period. <P>COPYRIGHT: (C)2008,JPO&INPIT |
