摘要 |
An exhaust treatment device (100) comprises a substrate assembly (12) disposed in a housing (14), wherein the substrate assembly (12) comprises a first rack (22) comprising a first array of openings, a second rack (24) comprising a second array of openings, wherein the second array of openings correspond to the first array of openings, a plurality of individual substrate elements (20) disposed in each of the first array of openings and the second array of openings; and a retention material (26) disposed between the first rack (22) and the second rack (24), wherein the retention material (26) is in physical communication with the plurality, the first rack (22), and the second rack (24). |