发明名称 Article and method for forming an article
摘要 An article and a method for forming the article are disclosed. The article comprising a composition, wherein the composition comprises, by weight percent, about 13.7% to about 14.3% chromium (Cr), about 9.0% to about 10.0% cobalt (Co), about 3.5% to about 3.9% aluminum (Al), about 3.4% to about 3.8% titanium (Ti), about 4.0% to about 4.4% tungsten (W), about 1.4% to about 1.7% molybdenum (Mo), about 1.55% to about 1.75% niobium (Nb), about 0.08% to about 0.12% carbon (C), about 0.005% to about 0.040% zirconium (Zr), about 0.010% to about 0.014% boron (B), and balance nickel (Ni) and incidental impurities. The composition is substantially free of tantalum (Ta) and includes a microstructure substantially devoid of Eta phase.
申请公布号 US9404388(B2) 申请公布日期 2016.08.02
申请号 US201414193576 申请日期 2014.02.28
申请人 GENERAL ELECTRIC COMPANY 发明人 Feng Ganjiang;Brown Mark R.;Arnett Michael Douglas;Laylock Matthew J.
分类号 C22C19/05;B22D21/00;F01D25/00;C22F1/10;B22D27/04;B22D7/00;F01D5/28;C22C19/00 主分类号 C22C19/05
代理机构 代理人
主权项 1. An article comprising a composition, wherein the composition comprises, by weight percent: about 13.7% to about 14.3% chromium (Cr); about 9.0% to about 10.0% cobalt (Co); about 3.5% to about 3.9% aluminum (Al); about 3.4% to about 3.8% titanium (Ti); about 4.0% to about 4.4% tungsten (W); about 1.4% to about 1.7% molybdenum (Mo); about 1.55% to about 1.75% niobium (Nb); about 0.08% to about 0.12% carbon (C); about 0.005% to about 0.040% zirconium (Zr); about 0.010% to about 0.014% boron (B); balance nickel (Ni) and incidental impurities, andwherein the composition is substantially free of tantalum (Ta) and the composition includes a microstructure substantially devoid of Eta phase.
地址 Schenectady NY US