Apparatus for polishing using improved plate supports

摘要

A set of supports are advantageously disposed on a top plate having a polishing surface useful for polishing workpieces, thereby applying substantially uniform pressure to the top plate. In a preferred embodiment, the supports are non-isosceles triangular elements distributed evenly at 45 degree increments around a ring-shaped top plate. This structure effectively compensates for radial stress variations arising from non-optimum positioning of support points with respect to the inner and outer diameters of the polishing surface.