发明名称 |
Distribution mask for controlling production of a coating by vapor deposition on substrate in treatment chamber |
摘要 |
The distribution mask takes the form of at least two shading plates (22) which are substantially coplanar and, by means of a shared control device (23), are both continuously pivotable between two extreme positions corresponding to the minimum and maximum values of the distance (E) between them. Independent claims are given for: (a) a treatment chamber that accommodates the distribution mask; and (b) production of multilayered coatings on substrates characterized by the fact that the distribution mask used has a variable surface, and by the fact that this surface is modified for each of the layers.
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申请公布号 |
FR2775298(A1) |
申请公布日期 |
1999.08.27 |
申请号 |
FR19980002177 |
申请日期 |
1998.02.24 |
申请人 |
ESSILOR INTERNATIONAL - COMPAGNIE GENERALE D'OPTIQUE |
发明人 |
BEINAT OLIVIER;CONTE DOMINIQUE |
分类号 |
G02B1/10;C23C14/04;(IPC1-7):C23C14/04;C23C14/24;G02B1/11 |
主分类号 |
G02B1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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