发明名称 Distribution mask for controlling production of a coating by vapor deposition on substrate in treatment chamber
摘要 The distribution mask takes the form of at least two shading plates (22) which are substantially coplanar and, by means of a shared control device (23), are both continuously pivotable between two extreme positions corresponding to the minimum and maximum values of the distance (E) between them. Independent claims are given for: (a) a treatment chamber that accommodates the distribution mask; and (b) production of multilayered coatings on substrates characterized by the fact that the distribution mask used has a variable surface, and by the fact that this surface is modified for each of the layers.
申请公布号 FR2775298(A1) 申请公布日期 1999.08.27
申请号 FR19980002177 申请日期 1998.02.24
申请人 ESSILOR INTERNATIONAL - COMPAGNIE GENERALE D'OPTIQUE 发明人 BEINAT OLIVIER;CONTE DOMINIQUE
分类号 G02B1/10;C23C14/04;(IPC1-7):C23C14/04;C23C14/24;G02B1/11 主分类号 G02B1/10
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